Mask Deduction for Surface Micromachining to Support Top-Down Design Flow

Based on surface micromachining process,the rough mask information is obtained by means of the operation on geometric elements among the layer models.The precise mask then is formed by revising the rough mask based on the process restrictions.Together with the reconstruction of the process model,the mask revision resolves the problem of multiple-layer etching and improves the manufacturability.The CAPP and CAD modules for micro devices are integrated coordinately to get an optimized design model and mask set.