Abstract: As the feature sizes of integrated circuits have been continually reducing to below exposure wavelength,some correcting techniques,such as OPC and PSM are indispensable to compensate for the distortions on wafer images.In this paper,we present an object-based approach to OPC named OPCM, which is a model-based OPC tool.Also,OPCM is applied to a rule-based OPC to enhance the practicability of the software.We show the validation of the approach by experimental results.